What is PHABLE? PHABLE (for “photonics enabler”) is a patented technology platform that has been developed by Eulitha for low-cost fabrication of periodic structures that are needed in many photonic applications. PHABLE is a mask based UV photolithography technology that takes full advantage of the existing infrastructure such as photoresists and photo masks. It enables the creation of periodic structures, such as arrays of holes on a hexagonal or square lattice, or linear gratings over large areas with high throughput.
The unique advantage of PHABLE is its ability to generate an optical image that has a very large depth of focus. This is unlike any of the conventional proximity, contact or projection lithography technologies. Therefore printing on non-flat surfaces, such as LED wafers, is accomplished with ease. In contrast to holographic lithography, the image is defined by a pattern on a mask and so printing a different pattern only requires a simple change of the mask. It also enables simultaneous printing of various patterns on a single chip or a wafer in much the same way different circuits are printed on silicon wafers.
Photonic Crystals on LEDs
Improvement of the light extraction efficiency from active regions of GaN- based LEDs has been a major challenge for the LED industry. The high refractive index of the layers in which the light is generated means that a significant portion of the light is trapped inside which is eventually absorbed and lost. Patterning the surface of the LEDs with a photonic crystal pattern can improve the efficiency of these devices by a factor of 2-3. It also gives significant control over the angular distribution of the emitted light. The economic and environmental gains that may be derived from higher-efficiency LED devices are immense.
Similar photonic patterns are also needed for other applications such as nanowire-based LEDs and photovoltaic devices. Heteroepitaxy on patterned Si substrates and epitaxial layer overgrowth (ELO) methods also require periodic patterns. The list of emerging applications in the photonics sector that require nanostructures continues to grow. Currently available lithographic technologies either do not have the necessary performance such as the imaging resolution or the ability to print over non-flat surfaces, or their cost is prohibitively high. PHABLE technology is ideally suited to address these emerging manufacturing problems.
Photonic molds and demonstration samples EULITHA now offers samples and wafer batch processing services to companies and researchers developing nanostructure-based products who are interested in taking advantage of this breakthrough technology.
Samples available for demonstration and product development:
?Two options for sample type:
?Photoresist patterns on 2" - 4" wafers provided by customers
?Patterns etched in Silicon wafers suitable for use as Nanoimprint stamps
?Three different patterns available; each pattern has 4cm2 area; one patterned area per wafer: