PHABLE (for “photonics enabler”) is a patented technology platform that has been developed by Eulitha (www.eulitha.com) for low-cost fabrication of periodic nanostructures that are needed in many photonic applications.

The applications are almost unlimited including:

? LED light extraction
? Nanopatterned sapphire substrates (NPSS) for LEDs
? Wiregrid polarizers for LCD displays
? Nanopatterned solar (photovoltaic) cells
? Antireflection layers
? Color filters
? Nanowire LEDs
? Nano-particle production
? Biosensors

Eulitha has an extensive patent portfolio on this new technology with more than 10 patents issued or pending.

PHABLE is a mask based UV photolithography technology that takes full advantage of the existing infrastructure such as photoresists and photo masks. It enables the creation of periodic structures, such as arrays of holes on a hexagonal or square lattice, or linear gratings over large areas with high throughput.

The unique advantage of PHABLE is its ability to generate an optical image that has a very large depth of focus. This is unlike any of the conventional proximity, contact or projection lithography technologies. Therefore printing on non-flat surfaces, such as LED wafers, is accomplished with ease.

In contrast to holographic lithography, the image is defined by a pattern on a mask and so printing a different pattern only requires a simple change of the mask. It also enables simultaneous printing of various patterns on a single chip or a wafer in much the same way different circuits are printed on silicon wafers.

- Hexagonal array, pitch 1000nm / hole diameter 270nm

- Hexagonal array, pitch 520nm / hole diameter 250nm

- Linear grating, pitch 300nm / linewidth 140nm

- Square array, pitch 500nm / hole diameter 250nm